OpenSilicon

Open-source semiconductor fabrication for the home lab. Build and operate IC fabrication equipment with detailed guides, CAD files, firmware, and process recipes.

About

OpenSilicon brings semiconductor fabrication capabilities into the home lab. This project provides comprehensive documentation, designs, and software for building functional IC fabrication equipment for research, education, and experimentation.

We are currently developing the alpha stage of the fabrication pipeline, targeting sub micron feature resolution across the complete process flow: spin coating, direct write lithography, metrology, oxidation, and physical vapor deposition (PVD).

Status

Alpha Stage - Active Development

This is an early-stage project. All equipment designs and processes are works in progress and subject to change. Current development is running two parallel tracks:

Metrology (FPM / R-FPM)

• Working prototype complete
• Fourier Ptychographic Microscopy (FPM) and Reflective FPM (R-FPM) under active characterization

Direct Write Lithography (405nm)

• Laser control code and firmware complete
• Actively working on motion circuitry and positioning firmware
• Investigating voice coil actuators from blu-ray drive for fine positioning
• Separate 3-axis alignment tool in development

Other Systems

• Spin coating system
  • Prototype full assembly complete
  • TODO: Look into web socket connectivity issues
  • TODO: Add a resist fill method
• Oxidation furnace fabrication pipeline
• PVD deposition system integration
• Process characterization and documentation

Join us to help shape the project during these formative stages.

Getting Started

Prerequisites

• Basic electronics and mechanical assembly experience
• Interest in semiconductor fabrication and experimental work
• Familiarity with working safely with high temperatures and electrical systems
• 3D printer access (optional, for custom components)

Next Steps

1. Review the documentation to understand the current state of each component
2. Check open issues to see what's being worked on
3. Start contributing - documentation, testing, and feedback are valuable at this stage

Equipment in Development

| Equipment | Status | Notes | |-----------|--------|-------| | Spin Coater | In Progress | Open issues remain | | FPM / R-FPM Metrology | Working Prototype | Active characterization | | Direct Write Lithography | In Progress | Laser firmware complete; positioning and alignment in development | | 3-Axis Alignment Tool | In Progress | Companion to lithography system | | Oxidation Furnace | In Progress | Initial build phase | | PVD Deposition System | In Progress | Initial build phase |

License

OpenSilicon is licensed under the GNU General Public License v3. See LICENSE for details.

This project integrates components licensed under GPLv3. When using or modifying this project, you must:

• Provide source code to users
• License derivative works under GPLv3
• Include a copy of the license
• State significant changes made

Contributing

We actively welcome contributions. This project is in its early stages, and input from the community is essential.

Getting Started with Contributing

1. Check open issues and discussions
2. Reach out with ideas or questions before starting major work
3. Submit pull requests for feedback and discussion

Ways to Contribute

• Share feedback on design decisions and approaches
• Document your work and help build the knowledge base
• Report issues, problems, observations, and learnings
• Propose design changes or optimizations
• Contribute firmware, software, and design improvements
• Help characterize equipment performance

Community

• GitHub Discussions: Ask questions and discuss ideas
• Issues: Report bugs and suggest features
• Email: parker.ellwanger@gmail.com

Roadmap

• [ ] Complete FPM/R-FPM metrology characterization
• [ ] Complete lithography positioning system (voice coil + 3-axis alignment)
• [ ] Complete alpha stage (sub micron) for all equipment
• [ ] Finalize process procedures and characterization data
• [ ] Publish comprehensive build guides
• [ ] Establish baseline performance metrics
• [ ] Improve lithography system resolution to work with the Open PDKs at 130nm process

Performance & Limitations

OpenSilicon is targeting:

• Feature resolution: sub micron (alpha stage)
• Use case: Research, education, and experimentation
• Scale: Small-batch processing
• Goal: Accessible home lab fabrication, not production

Safety

This project involves significant hazards. Home semiconductor fabrication includes:

• High temperature operation (up to 1000°C+)
• High voltage electrical systems
• UV radiation exposure
• Chemical hazards

Users are responsible for understanding and mitigating these risks. Always follow safety procedures and never operate equipment unsupervised.

Building from Source

All designs are provided in open formats. No proprietary software is required:

• CAD Files: STEP and STL formats
• Firmware: Open-source microcontroller code
• Software: Python and standard development tools

Acknowledgments

OpenSilicon builds on research and contributions from the open-source hardware community and makers exploring accessible semiconductor fabrication.

Disclaimer

Use of OpenSilicon designs and instructions is at your own risk. The authors assume no liability for injuries, property damage, or other consequences from assembly, operation, or misuse of equipment built from these designs.

Support

If you find OpenSilicon interesting, star this repository, share your interests and expertise, contribute to development, and help improve documentation.

Have questions? Start a discussion or email us.

Found an issue? Report it.